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UN NO 2193 Purity 99.9% FC1160 Electronic Gases For Semiconductor Manufacturing

Wuhan Newradar Special Gas Co.,Ltd
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UN NO 2193 Purity 99.9% FC1160 Electronic Gases For Semiconductor Manufacturing

Brand Name : newradar
Model Number : N/A
Certification : ISO/DOT/GB
Place of Origin : China
MOQ : 1000 kilogram
Price : negotiation
Payment Terms : L/C, , T/T, Western Union, MoneyGram
Supply Ability : 3,00 ton per month
Delivery Time : 15-25 working days after received your payment
Packaging Details : standard export packing:each cylinder to be protected by two poly-nets,standing on wooden pallet wrapped by plastic film
Thermodynamic data : Phase behaviour solid–liquid–gas
Spectral data : UV, IR, NMR, MS
Purity : 99.9%~99.999%
Other Names : Carbon hexafluoride, 1,1,1,2,2,2-Hexafluoroethane, Perfluoroethane, Ethforane, Halocarbon 116, PFC-116, CFC-116, R-116, Arcton 116, Halon 2600
Appearance : Colorless Liquefied Gas
UN NO. : 2193
Grade Standard : Electron Grade Industrial Grade
Synonyms : 1,1,1,2,2,2-Hexafluoroethane;C2F6;ethane,hexafluoro-;Ethylhexafluoride;f116;F-116;FC1160;Fluorocarbon 116
Application : Electronics equipment,transformer,refrigerating fluid
MF : C2F6
MW : 138.01
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Purity 99.9% FC1160 Gases Used As A Versatile Etchant In Semiconductor Manufacturing

Hexafluoroethane​ Description:


1. Used as insulation gas, plasma etching agent, high dielectric strength Ling-agent
2. For the microelectronics industry for plasma etching gas and device surface cleaning, fiber production, low temperature refrigeration.
3. Harmful to the environment, the water and the atmosphere can cause pollution, the atmospheric ozone layer has a strong destructive force.


Specifications:


1. Physical properties


Commodity

Hexafluoroethane

Molecular Formula

R116

CAS No

76-16-4

UN No.


2193

Hazardous Class

2.2

MF:

C2F6

Cylinder Capacity

40L, 500L

Filling Weight

530kg/500L refillable cylinder

20kg/40L refillable cylinder

Storage and Transportation

Use, store and transport below 45C. Store in cool and well-ventilated areas. Keep away from fire, heat, sunlight and flammable substances. Handle carefully when loading and unloading to avoid damages to gas cylinders and accessories.


2. Typical technical data


Purity, %≥99.8
Moisture, PPm≤10
Acidity, PPm≤1
Vapor Residue, PPm≤100
AppearanceColorless, No turbid
OdorNo Strange Stench

Molecular Weight66.1
Boiling Point, °C-24.7
Critical Temperature, °C113.5
Critical Pressure, Mpa4.58
Specific Heat of Liquid, 30°C, [KJ/(kg°C)]1.68
ODP0
GWP0.014

Applications:


Multi - Functional Etching TechnologyIn The Production Of Semiconductor etching of metal
The Metal Substrate

It can be used in the selective etching of metal silicon metal and metal oxide.

Under prolonged exposure to fire or intense heat the containers may rupture violently and rocket.



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