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High Relative Density Electronic Gases Purity 99.9% Hexafluoroethane F116

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High Relative Density Electronic Gases Purity 99.9% Hexafluoroethane F116

High Relative Density Electronic Gases Purity 99.9% Hexafluoroethane F116

Purity 99.9% Hexafluoroethane, F116 For Etching Of Silicon Dioxide Over Silicon Description: Hexafluoroethane can be used in a multi-functional etching technology, common in the production of ...

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